Nitrogen doped graphene has been created at our facilities. Ideal for exfoliation. Nitrogen doping is fixed at 1.5-2% and the lateral sizes of the flakes can reach more than 50 microns.

制备方法：层间催化裂解法 厚度：1~5nm 直径：~5um 比表面积：90-130 m2/g 外观：黑色粉末

制备方法： 层间催化裂解法 厚度：~2nm 直径：5~10um 纯度：98% 含氧量：1.44% 电导率：~2597 s/cm

Carboxyl (-COOH) functionalized graphene has been developed at our facilities. Can be deposited on various substrates either by conventional mechanical exfoliation or spin coating in the solution

Semiconductor analog of graphene: Graphene oxide has been synthesized at our R&D facilities using modified reaction Hummer technique.

Graphene fluoride has been developed our facilities. Carbon to Fluoride ratio is 1:1 and the particle size ranges from 1-15 microns. Electrical resistivity is 1E11-1E12 Ohm.cm.